Dielectric Films Magnetron Deposition Sputter Coater In Perovskite Thin-Film Battery Industry

Magnetron Sputtering Deposition in Perovskite Thin-film Battery Industry


Applications

Working Principle
Magnetron sputtering is to constrain and extend the motion paths of electron by magnetic field, change the motion
directions of electron, increase the ionization rate of working gas and effectively use the energy of electrons.
Magnetron sputtering has the following characteristics: rapid deposition rate, high deposition efficiency, suitable for
large-scale application in industrial production; low substrate temperature, suitable for the coating of plastics and
other heat resisting substrates; high purity of the prepared films, good compactness, better film uniformity and strong
film-substrate cohesion; metal, alloy, oxide and other films can be prepared; pollution-free.

Features

Coating Sample

Process Steps
→ Place the substrate for coating into the vacuum chamber;
→ Roughly vacuumize;
→ Turn on molecular pump, vacuumize at top speed, then turn on the revolution and rotation;
→ Heating the vacuum chamber until the temperature reaches the target;
→ Implement the constant temperature control;
→ Clean elements;
→ Revolve and back to the origin;
→ Coating film according to process requirements;
→ Lower temperature and stop the pump assembly after coating;
→ Stop working when the automatic operation is finished.

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Perovskite Thin-film Battery Magnetron Sputtering Deposition

Perovskite Thin-film Battery magnetron sputter coater

dielectric films magnetron sputter coater

Dielectric Films Magnetron Deposition Sputter Coater In Perovskite Thin-Film Battery Industry Images